[M-2] Characterization and Device Applications

4:45 PM - 5:00 PM JST(7:45 AM - 8:00 AM UTC)

[M-2-02] Time-dependent dielectric breakdown characterization of bulk boron nitride films in sp²-phase prepared by a reactive plasma assisted coating method

〇Yuya Asamoto¹, Masao Noma², Shigehiko Hasegawa³, Michiru Yamashita⁴, Keiichiro Urabe¹, Koji Eriguchi¹ (1. Kyoto Univ. (Japan), 2. Shinko Seiki Corp. Ltd. (Japan), 3. Osaka Univ. (Japan), 4. Hyogo Prefectural Inst. Technol. (Japan))

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