[M-2] Characterization and Device Applications | 2024 International Conference on Solid State Devices and Materials

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Session Details

Oral Presentation11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[M-2]Characterization and Device Applications

Mon. Sep 2, 2024 4:15 PM - 5:30 PM JST
Mon. Sep 2, 2024 7:15 AM - 8:30 AM UTC

Room M (Special Conference Room)(4th Floor)

Session Chair: Yoriko Tominaga (Hiroshima Univ.), Shingo Ogawa (Toray Research Center, Inc.)

4:15 PM - 4:45 PM JST(7:15 AM - 7:45 AM UTC)Invited

[M-2-01 (Invited)]Three-Level Charge Pumping Technique for SiC-MOS Interface Characterization

〇Hiroshi Yano¹ (1. Univ. of Tsukuba (Japan))

4:45 PM - 5:00 PM JST(7:45 AM - 8:00 AM UTC)

[M-2-02]Time-dependent dielectric breakdown characterization of bulk boron nitride films in sp²-phase prepared by a reactive plasma assisted coating method

〇Yuya Asamoto¹, Masao Noma², Shigehiko Hasegawa³, Michiru Yamashita⁴, Keiichiro Urabe¹, Koji Eriguchi¹ (1. Kyoto Univ. (Japan), 2. Shinko Seiki Corp. Ltd. (Japan), 3. Osaka Univ. (Japan), 4. Hyogo Prefectural Inst. Technol. (Japan))

5:00 PM - 5:15 PM JST(8:00 AM - 8:15 AM UTC)

[M-2-03]Nondestructive Evaluation of Thermal-Process-Induced Change of Sn/Cu/Ni Plating Thin Film Stacks Based on EDX Measurement and Bayesian Inference

〇Yutaka Hoshina¹ (1. Sumitomo Electric Industries, Ltd. (Japan))

5:15 PM - 5:30 PM JST(8:15 AM - 8:30 AM UTC)

[M-2-04]Rapid Microwave Synthesis of Solution-Processed a-IGZO Thin-Film Transistors for High-Performance pH Sensing

〇Ki-Ju Park¹, Won-Ju Cho¹ (1. The Univ. of Kwangwoon (Korea))