[M-4] Wide Bandgap Materials

11:45 AM - 12:00 PM JST(2:45 AM - 3:00 AM UTC)

[M-4-04] Improvement of Fabrication Process for Top-down GaN Nanowires Using Contactless Photo-assisted Electrochemical Etching

〇Hisahiro Furuuchi^1,2, Taketomo Sato², Junichi Motohisa^1,2 (1. Graduate School of Info. Sci. and Tech., Hokkaido Univ. (Japan), 2. Res. Center for Integrated Quantum Electronics, Hokkaido Univ. (Japan))

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