[PS-01] 01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[PS-01-02] Germanium Gate Stack Fabrication at Low Temperature
using Nonheated Atomic Layer Deposition

〇Taisei Aso¹, Hajime Kuwazuru¹, Dong Wang¹, Keisuke Yamamoto¹ (1. Kyushu Univ. (Japan))

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