[PS-01] 01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[PS-01-14] AR-HAXPES Evaluation of the Effect of Hydrogen Plasma Treatment on the Chemical Bonding State and Distribution of Hydrogen in SiN Films

〇Yoshiharu Kirihara¹, Haruto Omata¹, Akira Yasui², Kiyokazu Nakagawa³, Yuichiro Mitani¹, Hiroshi Nohira¹ (1. Tokyo City Univ. (Japan), 2. JASRI (Japan), 3. Abit Technologies (Co. Ltd.) (Japan))

DOI:

https://doi.org/10.7567/SSDM.2024.PS-01-14

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