Presentation Information
[PS-01-14]AR-HAXPES Evaluation of the Effect of Hydrogen Plasma Treatment on the Chemical Bonding State and Distribution of Hydrogen in SiN Films
〇Yoshiharu Kirihara1, Haruto Omata1, Akira Yasui2, Kiyokazu Nakagawa3, Yuichiro Mitani1, Hiroshi Nohira1 (1. Tokyo City Univ. (Japan), 2. JASRI (Japan), 3. Abit Technologies (Co. Ltd.) (Japan))