[SO-PS-08] 08: Low Dimensional Devices and Materials

1:40 PM - 1:42 PM JST(4:40 AM - 4:42 AM UTC)

[SO-PS-08-06] Al-Catalyzed SiNW-based Si/Ge Core-Shell Heteroarchitectures and Hole Gas Accumulation Enhancement for Transistor Applications

〇Wipakorn Jevasuwan¹, Naoki Fukata¹ (1. National Institute for Materials Science (NIMS) (Japan))

DOI:

https://doi.org/10.7567/SSDM.2024.PS-08-06

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