Presentation Information
[A-1-06]Defect Characterization through Fin and Gate Modules for Complementary Field-Effect Transistor Fabrication
〇Xiuju Zhou1, Nachiketa Zhou Janardan1, Andrea Mingardi1, Ataklti Weldeslassie1, Anabela Veloso1, Lucas Petersen Barbosa Lima1, Serge Biesemans1, Kaushik Sah2, Roel Gronheid2, Andrew Cross2 (1. IMEC (Belgium), 2. KLA Corp. (United States of America))