[A-3] Process Technology and Characterization

10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)

[A-3-05] Accurate Si₃N₄ Wet Etching Rate Prediction with Small Training Data by Gaussian Process Regression

〇Yusuke Hirata¹, Koki Shibata¹, Naoko Misawa¹, Takashi Ota³, Yuki Yoshinaga³, Chihiro Matsui¹, Ken Takeuchi^1,2 (1. Department of Electrical Eng. and Info. Systems, The Univ. of Tokyo (Japan), 2. Systems Design Lab., Graduate School of Eng., The Univ. of Tokyo (Japan), 3. Cleaning Equipment Development Operations, SCREEN Semiconductor Solutions Co., Ltd. (Japan))