Presentation Information

[A-3-06]Characterization of Plasma-induced Damage on TiN/HfO2/SiO2 Stacked Structure during Multi-Vt Process Using Different Gas Chemistries

〇Hidefumi Hirabayashi1, Satoshi Sakai1, Kiyohiko Sato1, Naoyuki Kofuji1, Makoto Miura1 (1. Hitachi High-tech Corporation (Japan))