Presentation Information

[B-5-02]Enhancing Erase Efficiency in Oxide Semiconductor FeFET through Post-Deposition Annealing Engineering

〇Minglei Ma1, Haoji Qian1, Miaomiao Zhang1, Yian Ding1, Xiaoxi Li1, Bochang Li1, Yan Liu1, Jiajia Chen1, Chengji Jin1, Genquan Han1 (1. Xidian Univ. (China))

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