[B-5] Ferroelectric FET

9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)

[B-5-02] Enhancing Erase Efficiency in Oxide Semiconductor FeFET through Post-Deposition Annealing Engineering

〇Minglei Ma¹, Haoji Qian¹, Miaomiao Zhang¹, Yian Ding¹, Xiaoxi Li¹, Bochang Li¹, Yan Liu¹, Jiajia Chen¹, Chengji Jin¹, Genquan Han¹ (1. Xidian Univ. (China))