[B-5] Ferroelectric FET

9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[B-5-03] Evaluation of Polarization-Induced Interface Degradations in FeFETs Using Quasi-Static Split C-V Techniques: Comparison of Oxide-Semiconductor and Si Channels

〇Xuanhedong Gao¹, Zuocheng Cai¹, Zhenghong Liu¹, Zhao Jin¹, Xueyang Han¹, Yan-kui Liang¹, Yutong Chen¹, Eishin Nako¹, Shin-Yi Min¹, Mitsuru Takenaka¹, Shinichi Takagi¹, Kasidit Toprasertpong¹ (1. The Univ. of Tokyo (Japan))