[E-4] ReRAM

10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)

[E-4-01] Experimental Demonstration of Elliptical-shaped CMOS Process-compatible TaOx/HfO₂ ReRAM in 3D Structure

〇Park Minsik¹, Lee Aryeong¹, Park Solji¹, Sim Gapseop^1,2, Song Jonghyun^1,2, Park Namsoo², Cho Huijae², Kwon Soohyun², Kang Minho², Kim Youngjoo², Kim Heejong², Kwon Youna², Jeon Kanghyeok², Sul Woosuk², Kim Choulyoung¹, Ko Hyoungho¹, Lee Wonchul^1,2, Lee jongwon¹ (1. Chungnam National Univ. (Korea), 2. National Nanofab Center (Korea))