Presentation Information

[J-3-02 (Late News)]Evaluation of Lateral and Depth Distribution of Si Strain around Cu Through Silicon Via by Micro-Raman Spectroscopy

〇Ryota Fujimori1, Yuta Ito1, Atsushi Ogura1,2, Koichiro Saga3 (1. Meiji University (Japan), 2. Meiji Renewable Energy Laboratory (Japan), 3. Sony Semiconductor Solutions Corporation (Japan))