Presentation Information

[J-6-02]A novel solution to alleviate bit-line break and roughness in 10nm-class high-k metal gate DRAM

〇Jieun Lee1, Taehoon Kim1, Donghee Choi1, Suji Kim1, Dongseok Kim1, Dongkyu Jang1, Taehoon Park1, Hyodong Ban1 (1. Samsung Electronics (Korea))