Presentation Information

[J-6-05 (Late News)]Temperature Dependence of Non-polar Switching Characteristics of carbon-doped HfOx thin films formed by mist CVD for CeRAM

〇Masamichi Azuma1,2, Mamoru Ikeda1, Tsubasa Miyamoto1, Hiroyuki Nishinaka1 (1. Kyoto Institute of Technology (Japan), 2. Symetrix Corp. (United States of America))