Presentation Information

[K-2-02]Elucidation of Hidden Grain-Boundary Effects in MOCVD MoS2 Films via Single-Grain device and ultra-short channel TLM

〇Keisuke Atsumi1, Shuhong Li1, Tomonori Nishimura1, Kaito Kanahashi1, Yoshiki Sakuma2, Kosuke Nagashio1 (1. University of Tokyo (Japan), 2. National Institute of Materials Science (Japan))

Password required to view