[K-2] Characterization I

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[K-2-02] Elucidation of Hidden Grain-Boundary Effects in MOCVD MoS₂ Films via Single-Grain device and ultra-short channel TLM

〇Keisuke Atsumi¹, Shuhong Li¹, Tomonori Nishimura¹, Kaito Kanahashi¹, Yoshiki Sakuma², Kosuke Nagashio¹ (1. University of Tokyo (Japan), 2. National Institute of Materials Science (Japan))

DOI:

https://doi.org/10.7567/SSDM.2025.K-2-02

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