Presentation Information
[K-2-02]Elucidation of Hidden Grain-Boundary Effects in MOCVD MoS2 Films via Single-Grain device and ultra-short channel TLM
〇Keisuke Atsumi1, Shuhong Li1, Tomonori Nishimura1, Kaito Kanahashi1, Yoshiki Sakuma2, Kosuke Nagashio1 (1. University of Tokyo (Japan), 2. National Institute of Materials Science (Japan))