Presentation Information

[SO-PS-04-07]Orientation Dependence of Structural Stability and Band Alignment for N-incorporated 4H-SiC/SiO2 Interfaces: A DFT-Based Approach

〇Naoto Ise1, Toru Akiyama1, Tetsuo Hatakeyama2, Kenji Shiraishi3, Takashi Nakayama4 (1. Mie University (Japan), 2. Toyama Prefectural University (Japan), 3. Tohoku University (Japan), 4. Chiba University (Japan))

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