[SO-PS-10] 10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process

1:36 PM - 1:38 PM JST(4:36 AM - 4:38 AM UTC)

[SO-PS-10-04] MOS Structure Based Characterization of NiO Thin Films Deposited by Oxygen-Controlled Magnetron Sputtering

〇Qiaoyu Hu¹, Robert Sokolovskij², Wenmao Li¹, Wenchuan Tao¹, Qing Wang¹, Hongyu Yu^1,2 (1. Southern Univ. of Sci. and Tech. (China), 2. Shenzhen Polytechnic Univ. (China))