Poster Session 1

[5OlXCzC1-09] Investigation of Fully Depleted Silicon On Insulator Devices.

*Samiul Haque Touhid¹, Mubashara Maisha¹, Maisha Tasnim Adri¹, Zannatun Nahar¹, Dr. Towhid Adnan Chowdhury¹ (1. Ahsanullah University of Science and Technology (Bangladesh))

Keywords:

FD SOI MOSFET,Kink Effect Suppression,TCAD simulation,Gate Oxide Thickness,Buried Oxide Thickness,Channel Doping Concentration

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