[19p-A310-1~13] 4.2 Photonics Devices, Photonic Integrated Circuit and Silicon Photonics

13:30 〜 13:45英語発表

[19p-A310-2] Low temperature annealing for vanadium dioxide in photonic integrated circuits

〇(DC)Yuxin Du¹, Kai Sun¹, Zihang Zheng¹, Cornelis H de Groot¹, Xu Fang¹ (1.Univ. of Southampton)

キーワード：

Vanadium dioxide、Low temperature annealing

We show at the annealing temperature of vanadium dioxide (VO₂) fabricated using atomic layer deposition can be suppressed to 300 °C, significantly improving the compatibility of VO₂ with photonic integrated circuits.