[C01-13a-IV] 受賞講演、EUV光源、アト秒科学

10:00 〜 10:15

[C01-13a-IV-03] 【論文発表賞応募演題】Vacuum ultraviolet cleaning mode for mitigating tin contamination in extreme ultraviolet lithography sources

*ZIJUN ZHONG¹, Nozomi Tanaka¹, James Edward Hernandez¹, Yulin Gong¹, Katsunobu Nishihara^1,2, Atsushi Sunahara^3,1, Tomoyuki Johzaki^4,1, Kyung Sik Kang⁵, Shinji Ueyama⁶, Shinsuke Fujioka^1,7 (1. Institute of Laser Engineering, The University of Osaka, 2. Osaka Metropolitan University, 3. Purdue University, 4. Hiroshima University, 5. Semiconductor R&D Center, Samsung Electronics Co. Ltd., 6. Samsung Device Solutions R&D Japan, Samsung Japan Corporation, 7. National Institute for Fusion Science)