[AMD5/FMC7] Oxide TFT Manufacturing Technology | The 31st International Display Workshops (IDW '24)

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Oral PresentationWorkshop on Active Matrix Displays (AMD) : [AMD5/FMC7] Oxide TFT Manufacturing Technology

[AMD5/FMC7]Oxide TFT Manufacturing Technology

Fri. Dec 6, 2024 9:00 AM - 10:20 AM JST
Fri. Dec 6, 2024 12:00 AM - 1:20 AM UTC

Mid-sized Hall A

Chair: Susumu Horita (JAIST)
Co-Chair: Hirohiko Nishiki (Mitsui Kinzoku)

9:00 AM - 9:20 AM JST(12:00 AM - 12:20 AM UTC)Invited

[AMD5/FMC7-1(Invited)]Fluorination Technology for Reliable Metal-Oxide Thin-Film Transistors

Man Wong¹, *Wei Jiang¹ (1. The Hong Kong University of Science and Technology (China))

9:20 AM - 9:40 AM JST(12:20 AM - 12:40 AM UTC)

[AMD5/FMC7-2]Effects of Sequential Anneals in Sealed and Oxidizing Ambiences on Oxide Thin-Film Transistors

*JingYu Fan¹, Jianming Zhu¹, Xiao Li¹, Zhendong Jiang¹, Yunping Wang¹, Dan Yang¹, Zeyu Cai¹, Shengdong Zhang¹, Lei Lu¹ (1. Peking University (China))

9:40 AM - 10:00 AM JST(12:40 AM - 1:00 AM UTC)

[AMD5/FMC7-3]Top-Gate IGZO TFT With Dry Etching Process for High-Resolution Display Application

*Zhang Chunyu^1,2, Chen Chuanke^1,2 (1. IMECAS (China), 2. University of Chinese Academy of Sciences (China))

10:00 AM - 10:20 AM JST(1:00 AM - 1:20 AM UTC)Late News

[AMD5/FMC7-4L]Highly Reliable Hydrogen-Free Top-Gate Oxide TFT ~ Hydrogen-Free ICP-CVD SiO₂ and SiN_x films for TFTs ~

*Mamoru Furuta¹, Mir Mutakabbir Alom¹, Motoki Ando¹, Yoshihiro Sato², Takafumi Kambe², Tsutomu Satoyoshi² (1. Kochi University of Technology (Japan), 2. Tokyo Electron Technology Solutions Ltd (Japan))