Presentation Information
[PS-06]Effect of annealing temperature on the electrical characteristics of Al/CuO/p-Si MOS capacitors
*Siang-Yi Hong1, Xiao-Xuan Zeng1, Pei-Hsuan Su1, Yu-Hung Chen1 (1. Department of Microelectronics Engineering, National Kaohsiung University of Science and Technology (NKUST) (Taiwan))
Keywords:
Copper oxide,RF magnetron sputtering,MOS capacitors
Comment
To browse or post comments, you must log in.Log in