Presentation Information
[PS-09]Effects of Al Concentration and Annealing Method on Crystalline and Ferroelectric properties of Al:HfO2 Thin Films
*Tomoya Mifune1, Hideaki Tanimura1,2, Yuma Ueno2, Yusuke Tani2, Yukiya Sano1, Hironori Fujisawa1, Seiji Nakashima1, Ai I Osaka1, Shinichi Kato2, Takumi Mikawa2 (1. Univ. of Hyogo (Japan), 2. SCREEN (Japan))
Keywords:
ferroelectric thin film,Al:HfO2,Flash Lamp Annealing
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