Presentation Information
[PS-10]Consideration on the Coexisting Positive- and Negative-Imprinted Ferroelectric Domains and Their Imprint-Recovery in Non-Doped HfO2 MFM Capacitor
*Yukinori Morita1, Shutaro Asanuma1, Hiroyuki Ota1, Shinji Migita1 (1. AIST (Japan))
Keywords:
Ferroelectricity,HfO2,imprint,MFM
Comment
To browse or post comments, you must log in.Log in