Presentation Information
[PS-14]Estimation of Charge Trap Positions in Silicon Nitride Films Using Voltage-applied Hard X-ray Photoelectron Spectroscopy
*Yoshiharu Kirihara1, Hideyuki Yato1, Yuichiro Mitani1, Hiroshi Nohira1 (1. Tokyo City University (Japan))
Keywords:
Silicon nitride,Voltage-applied hard X-ray photoelectron spectroscopy,Carrier trap
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