Presentation Information
[PS-15]Fabrication of non-volatile memory using Al2O3/spin-coated CeOx/SiO2/Si stack
*Hiroaki Tanaka1, Yoshiharu Kirihara1, Sorato Mikawa1, Tomoki Yoshida1, Ryousuke Ishikawa1, Hiroshi Nohira1 (1. Tokyo City University (Japan))
Keywords:
hard X-ray photoelectron spectroscopy,capacitance–voltage,atomic layer deposition,spin-coat
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