[S1] Hf-based Ferroelectrics

3:10 PM - 3:40 PM JST(6:10 AM - 6:40 AM UTC)

[S1-01] Interface Engineering for Crystal Phase Control and High Fatigue Resistance in Ferroelectric HfO₂-Based Thin Films

*Takashi Onaya^1,2 (1. NIMS (Japan), 2. The Univ. of Tokyo (Japan))

Keywords:

Ferroelectric HfO2-based thin films,Interface engineering,Atomic layer deposition