[S1] Hf-based Ferroelectrics

4:40 PM - 5:00 PM JST(7:40 AM - 8:00 AM UTC)

[S1-05] Engineering Al₂O₃ Doping Layers via Flash Lamp Annealing to Enhance Ferroelectricity in HfO₂ Thin Films

*Hideaki Tanimura^1,2, Tomoya Mifune¹, Yuma Ueno², Yusuke Tani², Hironori Fujisawa¹, Seiji Nakashima¹, Ai Isohashi Osaka¹, Shinichi Kato², Takumi Mikawa² (1. Univ. of Hyogo (Japan), 2. SCREEN Semiconductor Solutions (Japan))

Keywords:

Ferroelctricity,HfO2,Doping,Flash lamp annealing,Millisecond annealing