[S3] Advanced FET Technologies & Optoelectronics

1:00 PM - 1:30 PM JST(4:00 AM - 4:30 AM UTC)

[S3-01] Area Selective Deposition of Dielectric Film by Surface Passivation for Bottom-Up Nanopatterning Fabrication

*Shinichi Ike¹, Yumiko Kawano¹, Genki Hayashi¹, Shuji Azumo¹, Yusaku Kashiwagi¹, Tetsuya Goto¹ (1. Tokyo Electron Technology Solutions Limited (Japan))

Keywords:

Area Selective Deposition,ASD,Inhibitor,Cu/Low-k,DonD