[S3] Advanced FET Technologies & Optoelectronics

2:10 PM - 2:30 PM JST(5:10 AM - 5:30 AM UTC)

[S3-04] Roughness Resistance of Si(551) Surface under Wet Cleaning Evaluation toward Next-Generation CMOS Technologies

*Nawaphorn Kuhakongkiat¹, Shungo Nagata¹, Akihiro Suzuki², Hiroaki Yamamoto², Kazuhito Matsukawa², Koji Matsumoto², Ryo Yokogawa¹, Akinobu Teramoto¹ (1. Hiroshima University (Japan), 2. SUMCO (Japan))

Keywords:

Roughness,Si(551),Wet cleaning