Presentation Information
[S5-02]Oxygen Pressure Dependence of Linear-Parabolic Growth Retardation on Si(111)
*Hengyu Wen1, Yasutaka Tsuda2, Yuki Okabe1, Akitaka Yoshigoe2, Jiayi Tang3, Yuji Takakuwa4, Shuichi Ogawa1 (1. Nihon University (Japan), 2. JAEA (Japan), 3. JASRI (Japan), 4. Tohoku University (Japan))
Keywords:
Si dry oxidation,Linear-parabolic growth,Oxidation-induced Si-O breaking,Heat of adsorption,Hot hole trapping,Zero-order reaction,Real time XPS
Comment
To browse or post comments, you must log in.Log in