Session Details

[22p-A304-1~6]6.4 Thin films and New materials

Fri. Sep 22, 2023 1:00 PM - 2:30 PM JST
Fri. Sep 22, 2023 4:00 AM - 5:30 AM UTC
A304 (KJ Hall)
Junichi Shiogai(Osaka Univ.)

[22p-A304-1]Relationship between preparation conditions and lattice strain in VO2/TiO2(001)

〇Yuji Muraoka1, Reki Nakamoto2, Takanori Wakita1, Takayoshi Yokoya1 (1.Okayama Univ. RIIS, 2.Okayama Univ. Grad. Sch.)

[22p-A304-2]Effects of Variable Zirconium Doping via Co-sputtering Into BiVO4 Thin Film Under Visible Light Illumination

〇(B)Daryl Tatsuhiro Ide1, Shukur Gofurov1, Lingga Ghufira Oktariza1, Muhammad Monirul Islam1, Shigeru Ikeda2, Takeaki Sakurai1 (1.Univ. of Tsukuba, 2.Konan Univ.)

[22p-A304-3]Synthesis and optical properties of bismuth-based mixed-anion compounds epitaxial thin films

〇Zhengkang PENG1,2, Daichi Oka2, Yasushi Hirose2, Tomoteru Fukumura1 (1.Tohoku Univ., 2.Tokyo Metro. Univ.)

[22p-A304-4]Preparation of Mn3(Ge,Mn)N (111) epitaxial thin films on GaN using PLD

〇Takahiko Kawaguchi1, Yuya Sugahara1, Satoki Sugiura1, Naonori Sakamoto1, Naoki Wakiya1 (1.Shizuoka Univ.)

[22p-A304-5]A Study of the Growth of Aluminum Oxide Thin Films by Plasma Immersion Lattice Target Sputtering Method

〇(M1)Yuu Kiyama1, Takanobu Ima1, Tomoki Morita1, Masamichi Naitoh1, Tomonori Ikari2 (1.Kyushu Inst. of Tech., 2.NIT, Ube College)

[22p-A304-6]Low-Refractive-Index of non-crystalline TiO2 thin Film by Combination Deposition

〇Mai Hayamizu1, Hiroshi Murotani2, Takayuki Matsudaira3 (1.Grad. Sch. Tokai Univ., 2.Tokai Univ., 3.SHINCRON CO. LTD.)