Session Details
[23a-B205-1~11]13.2 Exploratory Materials, Physical Properties, Devices
Sat. Sep 23, 2023 9:00 AM - 12:00 PM JST
Sat. Sep 23, 2023 12:00 AM - 3:00 AM UTC
Sat. Sep 23, 2023 12:00 AM - 3:00 AM UTC
B205 (Civic Auditorium)
Haruhiko Udono(Ibaraki Univ.), Kenji Yamaguchi(QST), Tetsuji Kume(Gifu University)
[23a-B205-1]Demonstration of inert interfaces in BaSi2 double heterojunctions
〇Kosuke Hara1, Keisuke Arimoto1 (1.Univ. of Yamanashi)
[23a-B205-2]BaSI2 heterojunction solar cells using NiO hole transport layers
〇Haruki Takenaka1, Rui Du1, Takumi Sato1, Kimimaru Kajihara1, Yoichiro Koda2, Masami Mesuda2, Kaoru Toko1, Takashi Suemasu1 (1.Tsukuba Univ., 2.Tosoh Corporation)
[23a-B205-3]Fabrication of Zn1–xGexOy interlayers and application to p-BaSi2 solar cells
〇Kaori Takayanagi1, Sho Aonuki1, Ai Iwai1, Kaoru Toko1, Takashi Suemasu1 (1.Tsukuba Univ.)
[23a-B205-4]Controlling conductivity type of B-ion-implanted p-BaSi2 films prepared by sputtering
〇Takumi Sato1, Takenaka Haruki1, Rui Du1, Kimimaru Kajihara1, Yoichiro Koda2, Masami Mesuda2, Kaoru Toko1, Takashi Suemasu1 (1.Tsukuba Univ., 2.Tosoh Corporation)
[23a-B205-5]Relationship between post-annealing conditions and property changes in BaSi2 films
〇Ai Iwai1, Sho Aonuki1, Kaori Takayanagi1, Kaoru Toko1, Takasi Suemasu1 (1.Tsukuba Univ.)
[23a-B205-6]Physical properties evaluations of SrSi2
〇Motoharu Imai1, Babak Alinejad2, Haruhiko Udono2 (1.NIMS, 2.Ibaraki Univ.)
[23a-B205-7]First-principles calculations of conductivity control of AgBa2Si3 for thermoelectric applications
〇Kimimaru Kajihara1, Takamitsu Ishiyama1, Sho Aonuki1, Kaoru Toko1, Yoichiro Koda2, Masami Mesuda2, Shuta Honda3, Takashi Suemasu1 (1.Univ. of Tsukuba, 2.Tosoh Corporation, 3.Kansai Univ.)
[23a-B205-8]Room-temperature anisotropic conductivity dynamics in photoexcited silicon
〇(M2)Ami Shirai1, Yuta Murotani1, Tomohiro Fujimoto1, Natsuki Kanda1,2, Ryusuke Matsunaga1 (1.ISSP, The Univ. of Tokyo, 2.RAP, RIKEN)
[23a-B205-9]Nonradiative Recombination of Deep Levels in Si Formed by Electron Irradiation and Subsequent Annealing
〇Yuto Haraguchi1, Tatsuhiko Yatabe1, Tetsuo Ikari1, Atsuhiko Fukuyama1, Shun Sasaki2, Shuichi Samata2, Norichika Mitsugi2 (1.Univ. of Miyazaki, 2.SUMCO Corporation)
[23a-B205-10]Growth of CdSe on topological insulator Bi2Se3 by MBE
〇Ryuya Kotabe1, Tomohiro Kondo1, Terai Yoshikazu1 (1.Kyushu Inst. of Tech.)
[23a-B205-11]Preparation of MnSi1.75-x thin films on Si substrate by sputter deposition method
〇Hiroto Kubota1, Shunya Sakane1, Haruhiko Udono1 (1.Ibaraki Univ.)