Session Details
[17a-B1-1~7]13.4 Si processing /Si based thin film / MEMS / Equipment technology
Tue. Sep 17, 2024 9:00 AM - 11:00 AM JST
Tue. Sep 17, 2024 12:00 AM - 2:00 AM UTC
Tue. Sep 17, 2024 12:00 AM - 2:00 AM UTC
B1 (Exhibition Hall B)
Fumito Imura(Hundred Semiconductors Inc.), Yan Wu(Tokyo Inst. of Tech.)
[17a-B1-1]Stress dependence of cantilever type a-InGaZnO TFTs
〇Shinnosuke Iwamatsu1,2, Takashi Mineta2 (1.Yamagata Res. Inst. Tech., 2.Yamagata Univ.)
[17a-B1-2]Development of thin film piezoelectric resonator
〇Yurina Amamoto1, Koji Terumoto1, Noriyuki Shimoji1, Takashi Naiki1, Kenji Goda1, Takashi Kimura1, Yoshiaki Oku1 (1.Rohm Co., Ltd.)
[17a-B1-3]Suppression of Proof-Mass Geometry on Warpage in Highly Sensitive Gold Single-Axis MEMS Accelerometers
〇(B)Chihaya Mukaide1, Devi Srujana Tenneti1, Kisuke Miyado1, Torauto Yamada1, Katsuyuki Machida1, Tomoyuki Kurioka1, Tso-Fu Mark Chang1, Masato Sone1, Yoshihiro Miyake1, Hiroyuki Ito1 (1.TokyoTech.)
[17a-B1-4]Effect of Perforated Proof-Mass Hole Size on Brownian Noise BN of Gold Single-Axis MEMS Accelerometer for Micro-g Level Sensing
〇(B)Torauto Yamada1, Kisuke Miyado1, Devi Srujana Tenneti1, Chihaya Mukaide1, Katsuyuki Machida1, Tso-Fu Mark Chang1, Tomoyuki Kurioka1, Masato Sone1, Yoshihiro Miyake1, Hiroyuki Ito1 (1.Tokyo Tech.)
[17a-B1-5]Investigation of Factors that Degrade the Sensitivity of three-axes Piezo-resistive Accelerometer in Minimal-Fab Process
〇Hiroshige Kogayu1, Ryuhei Sekifuji1, Hiroyuki Tanaka2, Fumito Imura3, Takashi Yajima1, Shiro Hara1,2,3 (1.MINIMAL, 2.AIST, 3.Hundred)
[17a-B1-6]Visualization of strain distribution in MEMS resonators using stroboscopic differential interference contrast microscopy
〇Qian Liu1, Mirai Iimori1, Ya Zhang1 (1.Inst. of Eng., Tokyo Univ. of Agri. &Techno.)
[17a-B1-7]Development of smart CMP process control technology for 3D-structured FETs
〇Yuji Kasashima1, Takashi Matsukawa1, Kazuya Uejima1, Masashi Yamagishi1, Yoshihiro Hayashi1 (1.AIST SFRC)