Session Details
[9a-P06-1~3]13.4 Si processing /Si based thin film / MEMS / Equipment technology
Tue. Sep 9, 2025 9:30 AM - 11:30 AM JST
Tue. Sep 9, 2025 12:30 AM - 2:30 AM UTC
Tue. Sep 9, 2025 12:30 AM - 2:30 AM UTC
P06 (Gymnasium)
[9a-P06-1]Etch pit suppression by using Ar gas addition in Quartz Deep RIE
〇Kazuki Yoshida1, Naoya Yamada1, Toru Yahagi1, Mutsuto Katoh1 (1.Yamagata Research Inst. Tech.)
[9a-P06-2]Evaluation of Fabrication Tolerances on Sub-Terahertz-Band Silicon BIC Cavities
〇Yusuke Kondo1, Kazunori Shibata2, Shuichi Murakami1 (1.ORIST, 2.Osaka Univ.)
[9a-P06-3]Etching characteristics of single crystal Si with 1% KOH solution containing carbon-based materials
〇Kengo Kimura1, Hiroshi Tanaka1 (1.Aichi Institute of Technology)