Session Details
[15p-P09-1~2]13.4 Si processing /Si based thin film / MEMS / Equipment technology
Sat. Mar 15, 2025 4:00 PM - 6:00 PM JST
Sat. Mar 15, 2025 7:00 AM - 9:00 AM UTC
Sat. Mar 15, 2025 7:00 AM - 9:00 AM UTC
P09 (Gymnasium)
[15p-P09-1]Etching rate control of HSQ etch back process for nano-sized electrode fabrication
〇Takeshi Fujii1, Kaori Fujii1, Guohai Chen1, Yamada Takeo1 (1.AIST)
[15p-P09-2]Substrate Temperature Dependence of Dry Etching of Epitaxially Grown Si0.7Ge0.3 and Si using H2 Diluted CF4
〇Kotaro Ozaki1, Ibuki Saburi2, Takayoshi Tsutsumi3, Kenji Ishikawa3, Yuji Yamamoto4, Wei-Chen Wen4, Katsunori Makihara1 (1.Nagoya Univ. Eng., 2.Nagoya Univ., 3.Nagoya Univ. cLPS, 4.IHP)