[18a-S2_204-1~6] 23.1 Joint Session N "Informatics" | The 73rd JSAP Spring Meeting 2026

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Oral presentation23 Joint Session N "Informatics" : 23.1 Joint Session N "Informatics"

[18a-S2_204-1~6]23.1 Joint Session N "Informatics"

Wed. Mar 18, 2026 11:30 AM - 1:00 PM JST
Wed. Mar 18, 2026 2:30 AM - 4:00 AM UTC

S2_204 (South Bldg. 2)

11:30 AM - 11:45 AM JST(2:30 AM - 2:45 AM UTC)

[18a-S2_204-1]Prediction of PL Intensity from Graph Representations of Microstructures in Polycrystalline Silicon

〇(B)Youngjin Park¹, Daiki Hatanaka², Ryoji Katsube², Hiroaki Kudo³, Kentaro Kutsukake^2,4, Noritaka Usami^2,4,5 (1.School Eng., Nagoya Univ., 2.Grad Eng., Nagoya Univ., 3.Grad. Info., Nagoya Univ., 4.IMaSS, Nagoya Univ., 5.InFuS, Nagoya Univ.)

11:45 AM - 12:00 PM JST(2:45 AM - 3:00 AM UTC)

[18a-S2_204-2]Numerical Simulation of Convection Diffusion Transition in SiGe Crystal Growth under Different Gravity Levels

〇(B)Ryusei Tsuboi¹, Souta Miyamoto¹, Katsuaki Tanabe¹ (1.Kyoto Univ.)

12:00 PM - 12:15 PM JST(3:00 AM - 3:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[18a-S2_204-3]Development of a Methodology for Rapid Identification of Optimal Deposition Conditions in Supercritical Fluid Deposition (1)

〇(B)Seitaro Sanai¹, Shota Oda², Takeshi Hashishin³, Ichiro Akai⁴, Takeshi Momose⁵ (1.FE, Kumamoto Univ., 2.GSST, Kumamoto Univ., 3.FAST, Kumamoto Univ., 4.IINA, Kumamoto Univ., 5.SE, Kumamoto Univ.)

12:15 PM - 12:30 PM JST(3:15 AM - 3:30 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[18a-S2_204-4]Development of a Methodology for Rapid Identification of Optimal Deposition Conditions
in Supercritical Fluid Deposition (2)

〇Shota Oda¹, Seitaro Sanai², Takeshi Hashishin³, Ichiro Akai⁴, Takeshi Momose⁵ (1.GSST, Kumamoto Univ., 2.FE, Kumamoto Univ., 3.FAST, Kumamoto Univ., 4.IINA, Kumamoto Univ., 5.SE, Kumamoto Univ)

12:30 PM - 12:45 PM JST(3:30 AM - 3:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[18a-S2_204-5]Real-Time Temperature Measurement of SiC Wafers During Thermal-Plasma-Jet Annealing Using Machine-Learning-Assisted Optical-Interference Contactless Thermometry

〇Jiawen Yu¹, Hiroaki Hanafusa¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)

12:45 PM - 1:00 PM JST(3:45 AM - 4:00 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[18a-S2_204-6]Optimization of Process-Condition Sequences Using a Latent Space for Manufacturing Processes with Time-Evolving Systems

〇(M2)Takanao Sakamoto¹, Masaki Takaishi^2,3, Kentaro Kutsukake^1,2, Shunta Harada^1,2, Toru Ujihara^1,2 (1.Grad. Sch. Eng., Nagoya Univ., 2.IMaSS Nagoya Univ., 3.Aixtal)

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