Presentation Information
[1B08]Vacuum-based plasma deposition techniques to fabricate low dimensional materials with applications in Electronics and Green Applications
*Daniel HC Chua1 (1. Department of Materials Science and Engineering, National University of Singapore)
Vacuum-based plasma deposition techniques such as pulsed laser deposition and RF Magnetron sputtering are able to deposit high quality low dimensional materials with excellent process control, good repeatability, a wide range of different nanomaterials and can accommodate large area substrates. In this talk, we shall first show that high quality low dimensional 2D nanostructures such as WS2, MoS2 and graphene are successfully fabricated and at lower growth temperature than standard chemical based techniques. Furthermore, through manipulation of the deposition parameters, vertically aligned free-standing 2D structures can also be fabricated. Lastly, we will show a different example of nanostructured CuS where it can be used as a non-volatile memory device yet the material can be further modified as a photothermal evaporator.