JVSS 2025
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Session Details

International Joint SymposiumInternational Joint Symposium

[1B06-10]International Affiliate Sessions

Mon. Oct 20, 2025 2:00 PM - 4:45 PM JST
Mon. Oct 20, 2025 5:00 AM - 7:45 AM UTC
B: 101(1F)
Chair:Tetsuhide Shimizu, Tomohiro Yamaguchi
Advancing Thin Film Technologies: Innovations for Next-Generation Semiconductor Devices
2:00 PM - 2:30 PM JST(5:00 AM - 5:30 AM UTC)

[1B06]Wafer-scaled Array Structures in Nano- and Micron-scales: Fabrication and Potential Application

*Jinn P. Chu1 (1. Dept. of Materials Sci. & Eng., National Taiwan University of Science and Technology)
2:30 PM - 3:00 PM JST(5:30 AM - 6:00 AM UTC)

[1B07]Oxidation of Silver and Rhodium surfaces

*Dan Killelea1 (1. Department of Chemistry, Loyola University Chicago)
3:00 PM - 3:30 PM JST(6:00 AM - 6:30 AM UTC)

[1B08]Vacuum-based plasma deposition techniques to fabricate low dimensional materials with applications in Electronics and Green Applications

*Daniel HC Chua1 (1. Department of Materials Science and Engineering, National University of Singapore)
3:30 PM - 3:45 PM JST(6:30 AM - 6:45 AM UTC)

Break time

3:45 PM - 4:15 PM JST(6:45 AM - 7:15 AM UTC)

[1B09]Tin oxide (SnOx) deposition on silicon (100) substrates using low vacuum DC magnetron sputtering

*Michelle Marie Sendaydiego Villamayor1, Angela Centino Ortizano1, Shane Amarillo Bañados1 (1. Physics Department, College of Arts and Sciences, Central Mindanao University)
4:15 PM - 4:45 PM JST(7:15 AM - 7:45 AM UTC)

[1B10]van der Waals epitaxy of Bismuth Oxychalcogenide for Advanced Electronics

*Ying-Hao Chu1,2 (1. National Tsing Hua University, 2. National Yang Ming Chiao Tung University)
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