Presentation Information
[1F11]Influence of blocking layers on spinodal decomposition in shirasu-based glass thin films
*Reon Imanishi1, Daisuke Noguchi1 (1. National Institute of Technology, Miyakonojo College)
We have been developing antifogging materials utilizing porous and capillary phenomena by preparing thin films from Shirasu, which is widely distributed in southern Kyushu. We prepare thin films from Shirasu using RF magnetron sputtering and then induce a spinodal structure through phase separation via heat treatment. A previous study revealed substrate dependence: the spinodal structure formed on silicon wafer substrates but not on soda-lime glass. This is likely due to the diffusion of Na+ and Ca2+ ions from the glass substrate, which alters the thin film's composition. In this study, we introduced a blocking layer between the substrate and the thin film to prevent diffusion and attempted to optimize the material and structure of the blocking layer. As a result, no effect was observed for silicon, but diffusion-prevention effects were suggested for Al and SiO2 blocking layers.