JVSS 2025
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Session Details

Oral PresentationThin Film (TF)

[1F08-15]Thin Film (TF)

Mon. Oct 20, 2025 2:00 PM - 4:30 PM JST
Mon. Oct 20, 2025 5:00 AM - 7:30 AM UTC
F: 202A(2F)
Chair:Ryota Akiyama, Shin-ichiro Tanaka
2:00 PM - 2:30 PM JST(5:00 AM - 5:30 AM UTC)

[1F08【招待講演】]MOCVD growth diagrams of group III–VI layered semiconductors toward nano-optoelectronic applications

*Yoshitaka Taniyasu1, Yukihiro Endo1, Yoshiaki Sekine1 (1. Basic Research Laboratories, NTT, Inc.)
2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)

[1F09]Photoelectron holographic study of atomic site occupancy of the Si dopant in k-Ga2O3(001)

*Yoshiyuki YAMASHITA1,2, YuHua TSAI1,2, Yusuke HASHIMOTO3, Tomohiro MATSUSHITA3, Piero MAZZOLINI4 (1. National Institute for Materials Science, 2. Kyusyu University, 3. Nara Institute of Science and Technology, 4. University of Parma)
2:45 PM - 3:00 PM JST(5:45 AM - 6:00 AM UTC)

[1F10]Analysis of Fe electronic states in Bi0.8Ba0.2FeO2.9 and Bi0.8Ba0.2FeO2.8F0.2 thin films using X-ray spectroscopy

*Akiko Kamigaito1, Kei Shigematsu2, Masaki Kobayashi3, Hiroshi Kumigashira4, Kenta Amemiya5, Akira Chikamatsu1 (1. Department of Chemistry, Faculty of Science, Ochanomizu University, 2. Materials and Structures Laboratory, Institute of Integrated Research, Institute of Science Tokyo, 3. NTT Basic Research Laboratories, 4. Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 5. Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization)
3:00 PM - 3:15 PM JST(6:00 AM - 6:15 AM UTC)

Break time

3:15 PM - 3:30 PM JST(6:15 AM - 6:30 AM UTC)

[1F11]Influence of blocking layers on spinodal decomposition in shirasu-based glass thin films

*Reon Imanishi1, Daisuke Noguchi1 (1. National Institute of Technology, Miyakonojo College)
3:30 PM - 3:45 PM JST(6:30 AM - 6:45 AM UTC)

[1F12]Influence of control factors on selective coating of spinodal structures using spin coating method

*Momoka Tominaga1, Daisuke Noguchi1 (1. National Institute of Technology, Miyakonojo college)
3:45 PM - 4:00 PM JST(6:45 AM - 7:00 AM UTC)

[1F13]Epitaxial growth of Ni(100) films on Cu /SrTiO3(100) substrate

*Fuka Watanabe1, Das Sudhansu1, Zhen-Dong Sun2, Hirokazu Ueta1,3, Takahiro Ozawa1, Katsuyuki Fukutani1,3 (1. Institute of industrial science., University of Tokyo, 2. School of Physics Shandong University, 3. Advanced Science Research Center Japan Atomic Energy Agency)
4:00 PM - 4:15 PM JST(7:00 AM - 7:15 AM UTC)

[1F14]Epitaxial growth of FeGeγ thin film with incommensurate Nowotny chimney ladder structure on Si substrate

*Tsukasa Terada1, Takafumi Ishibe1, Nobuyasy Naruse2, Yoshiaki Nakamura1 (1. Graduate School of Engineering Science, The University of Osaka, 2. Department of Fundamental Bioscience, Shiga University of Medical Science)
4:15 PM - 4:30 PM JST(7:15 AM - 7:30 AM UTC)

[1F15][Withdraw] Simulation driven vacuum coating precision control and pristine environments for next gen semiconductor devices

*Zeng LIN1, Guang Yu DU1 (1. Northeastern University)
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