Presentation Information
[3F12]Bayesian approach for time-resolved Si 2p XPS analysis during silicon oxidation
*Hiroshi Shinotsuka1, Kenji Nagata2, Hideki Yoshikawa1, Shuichi Ogawa3, Akitaka Yoshigoe4 (1. Research Network and Facility Services Division, National Institute for Materials Science, 2. Center for Basic Research on Materials, National Institute for Materials Science, 3. College of Industrial Technology, Nihon University, 4. Materials Sciences Research Center, Japan Atomic Energy Agency)
We present a Bayesian estimation framework for analyzing time-resolved Si 2p XPS spectra during the oxidation of silicon surfaces. Traditional XPS analysis requires prior knowledge and expert judgment, but our method enables automated and objective spectral decomposition. The Bayesian approach infers the number of peaks directly from the data and estimates their positions, widths, and intensities with uncertainty. This allows us to visualize the dynamic evolution of chemical states during oxidation. The analysis system is now implemented in the DICE platform at NIMS, providing seamless integration of experimental and computational tools for advanced surface characterization.