Presentation Information
[3H04]Metal/oxide nanolaminates of Al/Al2O3 by PVD-ALD: maximising strength-ductility-toughness
*Thomas Edwards1, Barbara Putz2, Hendrik Jansen2, Seiichiro II1, Damien Faurie3, Pierre-Olivier Renault4, Takahito Ohmura1, Johann Michler2 (1. National Institute for Materials Science, 2. Swiss Federal Laboratories for Materials Science and Technology (Empa), 3. Universite Paris Sorbonne, 4. Institut Pprime)
Ductile-brittle thin film multilayers of crystalline Al and amorphous AlOx are studied by our group, produced by atomic layer (AlOx) and physical vapour deposition (Al) uniquely-combined within a single deposition system. Both the amorphous oxide layer thickness and that of the metal have been optimised for strength (over 1 GPa) and ductility by testing in uni/bi-axial tension, microcompression and nanoindentation, whilst fracture behaviour was studied by notched microcantilever fracture testing, including at high temperature. The outcomes are compared to those of alternative thin film materials and using other measurement methods.