JVSS 2025
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Session Details

Divisions' sessionsDivision's Session

[3H01-07]Sputtering and Plasma Processes

Wed. Oct 22, 2025 9:00 AM - 11:45 AM JST
Wed. Oct 22, 2025 12:00 AM - 2:45 AM UTC
H: 303(3F)
Chair:Tetsuhide Shimizu, Takeo Nakano
ISSP2026 presession: Advancement in Sputtering & Plasma Processes for a Connected Future
9:00 AM - 9:30 AM JST(12:00 AM - 12:30 AM UTC)

[3H01]Fabrication of single-crystalline CoSn kagome metal thin films toward interconnect applications

*Tomoya Nakatani1 (1. National Institute for Materials Science)
9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)

[3H02]Evaluation of incident particle momentum during sputter-deposition using an in-situ stress observation system

*shigeki nakagawa1, Takuto Sekine1, Daisuke Iida1, Yutaka Nakamitsu2, Tetsuji Kiyota2 (1. Institute of Science Tokyo, 2. ULVAC, Inc.)
9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[3H03]Control of Film Structure by Dual Bipolar High-Power Pulsed Magnetron Sputtering at low gas pressures

*Kai Watanabe1, Takeo Nakano1, Suruz Mian2 (1. Department of Science and Technology, Seikei University, 2. School of Engineering, Tokai University)
10:00 AM - 10:30 AM JST(1:00 AM - 1:30 AM UTC)

[3H04]Metal/oxide nanolaminates of Al/Al2O3 by PVD-ALD: maximising strength-ductility-toughness

*Thomas Edwards1, Barbara Putz2, Hendrik Jansen2, Seiichiro II1, Damien Faurie3, Pierre-Olivier Renault4, Takahito Ohmura1, Johann Michler2 (1. National Institute for Materials Science, 2. Swiss Federal Laboratories for Materials Science and Technology (Empa), 3. Universite Paris Sorbonne, 4. Institut Pprime)
10:30 AM - 10:45 AM JST(1:30 AM - 1:45 AM UTC)

Break time

10:45 AM - 11:15 AM JST(1:45 AM - 2:15 AM UTC)

[3H05]Towards a deeper understanding of sputtering processes via ground state density imaging

*Nikolay Britun1 (1. Centre for Low-temperature Plasma Sciences, Nagoya University)
11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)

[3H06]Low temperature deposition of GaN by using high-power impulse magnetron sputtering

*Ikuma Masumori1, Mitsuki Akagawa1, Fuminori Yoda2, Atsushi Fujita2, Tetsuhide Shimizu1 (1. Graduate School of Systems Design, Tokyo Metropolitan University, 2. Shibaura Mechatronics Co., Ltd.)
11:30 AM - 11:45 AM JST(2:30 AM - 2:45 AM UTC)

[3H07]Enhancements of Raman scattering intensity of Rhodamine 6 G by Ag nanoparticles deposited by magnetron sputtering

*Eiji Kusano1 (1. Kanazawa Institute of Technology)
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