Materials Research Meeting 2025 (MRM2025)
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Oral SessionG. Advanced Materials and Emerging Technologies for Device Development : [G-3] Synthesis, Processing, and Nanoscale Characterization of Functional Oxide Thin Films - 9th MRS-J & E-MRS Bilateral Symposium-

[G3-O102]Oral 102

Tue. Dec 9, 2025 2:00 PM - 5:30 PM JST
Tue. Dec 9, 2025 5:00 AM - 8:30 AM UTC
Session 15(G218)
Chair:Koji Horiba(National Institutes for Quantum Science and Technology), Yuji Matsumoto(Tohoku University)
2:00 PM - 2:30 PM JST(5:00 AM - 5:30 AM UTC)

[G3-O102-01]Nanoscale Engineering of Compositional Fluctuation in Epitaxial Composites of Oxides for Exploration of Their New Properties and Functionalities

*Yuji Matsumoto1 (1. Tohoku Univ. (Japan))
2:30 PM - 2:50 PM JST(5:30 AM - 5:50 AM UTC)

[G3-O102-02]Synthesis of Epitaxial LaNiO3 thin film on Zirconia buffered Si substrate

*Haruka Zaizen1,2, Hidekazu Tanaka1,2,3, Hao-Bo Li1,2,3, Osamu Nakagawara4 (1. University of Osaka (Japan), 2. SANKEN (Japan), 3. OTRI (Japan), 4. I-PEX Piezo Solutions Inc. (Japan))
2:50 PM - 3:10 PM JST(5:50 AM - 6:10 AM UTC)

[G3-O102-03]Ultra-Low-Density Carbon Targets Synthesized by Pulsed Laser Deposition to Enhance fs-Laser–Plasma Coupling

*Valentin Craciun Craciun1,2, A. Magureanu2,3, S. A. Irimiciuc1, R Udrea4, A. Zubarev2, P.G. Bleotu2, P. Garoi1, G. Dorcioman1, D Craciun1, D Ursescu2, C Ticos2 (1. INFLPR (Romania), 2. ELI-NP and IFIN-HH (Romania), 3. National University of Science and Technology POLITEHNICA (Romania), 4. Apellaser (Romania))
3:10 PM - 3:30 PM JST(6:10 AM - 6:30 AM UTC)

[G3-O102-04]High Hall Mobility W-doped In2O3 Films with Thicknesses below 10 nm

*Tetsuya YAMAMOTO1, Hisashi Kitami2, Yugo Okada2 (1. Kochi Univ. Tech. (Japan), 2. SHI (Japan))
3:30 PM - 3:45 PM JST(6:30 AM - 6:45 AM UTC)

break

3:45 PM - 4:05 PM JST(6:45 AM - 7:05 AM UTC)

[G3-O102-05]Pressure Response of ZnO-Based Pressure Sensors with MgxZn1-xO Thin Films Grown by Plasma-Assisted MBE

*Haruyuki Endo1 (1. Tohoku Gakuin University (Japan))
4:05 PM - 4:25 PM JST(7:05 AM - 7:25 AM UTC)

[G3-O102-06]Effect of Mist CVD Reactor Design on the Crystallinity and Morphology of ZnO Thin Films

*Htet Su Wai1, Toshiyuki Kawaharamura1 (1. Kochi University of Technology (Japan))
4:25 PM - 4:45 PM JST(7:25 AM - 7:45 AM UTC)

[G3-O102-07]Influence of growth temperature on the composition of ZnMgO thin films
Deposited by mist CVD

*Ryosuke Ohashi1, Hetet Su Wai1, Chiaki Watanabe1, Tatsuki Okada1, Toshiyuki Kawaharamura1,2 (1. Kochi University of Technology (Japan), 2. Research Institute (Japan))
4:45 PM - 5:05 PM JST(7:45 AM - 8:05 AM UTC)

[G3-O102-08]ZnO Nanorods with Large Surface Area Prepared by Mist CVD Method for High Efficiency Photocatalytic Degradation

*Chaoyang Li1, Htet Su Wai1 (1. Kochi Tech. Univ. (Japan))
5:05 PM - 5:25 PM JST(8:05 AM - 8:25 AM UTC)

[G3-O102-09]Highly Conductive and Uniform Zicronium-Doped Tin Oxide Thin Films via Mist Chemical Vapor Deposition

*ABHAY KUMAR MONDAL1, Heit su1, Kun Liu1 (1. KOCHI UNIVERSITY OF TECHNOLOGY (Japan))
5:25 PM - 5:30 PM JST(8:25 AM - 8:30 AM UTC)

Time adjustment

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