2025 International Conference on Solid State Devices and Materials
Advanced Search

Session Details

Oral Presentation11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[H-4]Characterization and Device Applications

Wed. Sep 17, 2025 10:45 AM - 12:00 PM JST
Wed. Sep 17, 2025 1:45 AM - 3:00 AM UTC
Room H (314, 3rd Floor)
Session Chair: Shingo Ogawa (Toray Res. Center, Inc.), Wen-Wei Wu (National Yang Ming Chiao Tung Univ.)
10:45 AM - 11:15 AM JST(1:45 AM - 2:15 AM UTC)

[H-4-01 (Invited)]On-demand evaluation of metal/insulator/semiconductor structures by voltage-applied HAXPES

〇Hiroshi Nohira1 (1. Tokyo City Univ. (Japan))
11:15 AM - 11:45 AM JST(2:15 AM - 2:45 AM UTC)

[H-4-02 (Invited)]Challenges in Visualizing Buried Interfaces of Multi-Layered Thin-Film Structures for Applications: A Depth-Resolved and Spatiotemporal Big Data Analysis
Approach Based on Angle-Resolved XPS

〇Satoshi Toyoda1 (1. Scienta Omicron (Japan))
11:45 AM - 12:00 PM JST(2:45 AM - 3:00 AM UTC)

[H-4-03]Mapping of the Lattice Strain Tensor in Defect-Free Si1-xGex/SOI Multilayers Fabricated by Lateral-Selective Heteroepitaxy

〇Cedric Xavier Corley-Wiciak1, Chen-Hsun Lu2, Agnieszka Anna Corley-Wiciak1,3, Edoardo Zatterin1, Markus Andreas Schubert4, Carsten Richter2, Wei-Chen Wen4, Marvin Hartwig Zoellner4, Yuji Yamamoto4,5 (1. European Synchrotron Radiation Facility (France), 2. Leibniz-Inst. for Crystal Growth (Germany), 3. RWTH Aachen Univ. (Germany), 4. Leibniz-Inst. for Innovations for High Performance Microelectronics (Germany), 5. Nagoya Univ. (Japan))
Back to Category List