Session Details

[K-3]Device I

Wed. Sep 17, 2025 9:00 AM - 10:15 AM JST
Wed. Sep 17, 2025 12:00 AM - 1:15 AM UTC
Room K (413, 4th Floor)
Session Chair: Mahito Yamamoto (Kansai Univ.), Toshifumi Irisawa (AIST)

[K-3-01 (Invited)]Interfaces in Semiconductor Devices Based on Low-dimensional Materials: The Case of Flexible Carbon Nanotube TFTs and Analog ICs

〇Yutaka Ohno1 (1. Nagoya Univ. (Japan))

[K-3-02]Source/Drain Contact Formation Using H2S Annealing for TMDC-channel CMOS: NixNb1-xS2 Contacts for MoS2 nFET and NbS2 contacts for WSe2 pFET

〇Koki Hori1,2, Wen Hsin Chang2, Toshifumi Irisawa2, Naoya Okada2, Atsushi Ogura1,3 (1. Meiji Univ. (Japan), 2. AIST (Japan), 3. MREL (Japan))

[K-3-03]Nearly Ideal Subthreshold Swing in Monolayer WSe2 Top-Gate pFETs with Scaled EOT of 0.8 nm

〇Yu-wei Hsu1,2, Chen-Hsun Hsu2, Yu-Tung Lin1, Nien-En Chiang1, Ying-Zhan Chiu1, Shao-Heng Chen1, Sin-Yue Lee2, Ting-Hua Wei2, Zi-Quan Su2, Hung-Li Chiang2, I-Chih Ni1, Chih-I Wu1, Tsung-En Lee2 (1. National Taiwan Univ. (Taiwan), 2. National Yang Ming Chiao Tung Univ. (Taiwan))

[K-3-04]Coplanar Structure Design of Floating-gate Antiferroelectric Transistor with Multiple Operation Modes for Reconfigurable Neuromorphic Computing System

〇Yufei Shi1, Jiali Huo1, Yu-Chieh Chien1, Kah-Wee Ang1 (1. National Univ. of Singapore (Singapore))