[A-7] 2D Material Integration | 2025 International Conference on Solid State Devices and Materials

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Session Details

Oral Presentation01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[A-7]2D Material Integration

Thu. Sep 18, 2025 1:30 PM - 2:45 PM JST
Thu. Sep 18, 2025 4:30 AM - 5:45 AM UTC

Room A (301, 3rd Floor)

Session Chair: Keisuke Yamamoto (Kumamoto Univ.), Anabela Veloso (imec)

1:30 PM - 2:00 PM JST(4:30 AM - 5:00 AM UTC)

[A-7-01 (Invited)]TBD

TBD (1. TBD (Japan))

2:00 PM - 2:15 PM JST(5:00 AM - 5:15 AM UTC)

[A-7-02]Monolithic 3D CMOS Logic Integration of p-FinFET and 2D n-WSe₂ FET with Planar Local Back-Gate

〇Chi-Chun Cheng¹, Wen-Yuan Fei¹, Ching-Min Hsu¹, Po-Wen Chiu¹ (1. The Univ. of Hsinchu (Taiwan))

2:15 PM - 2:30 PM JST(5:15 AM - 5:30 AM UTC)

[A-7-03]CMOS-Friendly Doping Strategies for p-Type WSe₂ Field-Effect Transistors

〇Cheng-Chieh Hsieh¹, I-Ling Li¹, Cheng-Yang Hsu¹, Han-Hsiang Pai¹, Tsung-Che Hsieh¹, Hung-Hui Yang¹, Chien-Wei Chen³, Chih-Chao Yang², Ying-Hao Chu¹, Chao-Hui Yeh¹ (1. National Tsing Hua Univ. (Taiwan), 2. Taiwan Semiconductor Research Inst. (Taiwan), 3. Taiwan Instrument Research Inst. (Taiwan))

2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)

[A-7-04]Fabrication of Electro-Absorption Dual Graphene Modulators on 200 mm Wafer Scale

〇Rasuole Lukose¹, Ashraful Islam Raju¹, Pawan Kumar Dubey¹, Philipp Kulse¹, Steffen Marschmayer¹, Daniele Capista¹, Anna Peczek¹, Aleksandra Kroh¹, Marco Lisker^1,2, Andreas Mai^1,2, Mindaugas Lukosius¹ (1. IHP- Leibniz Institut für innovative Mikroelektronik (Germany), 2. Technical University of Applied Science Wildau (Germany))

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