講演情報
[19p-P01-65]Contact Resistance Measurements of Monolayer MoS2
〇(PC)Puneet Jain1, Shotaro Yotsuya1, Daisuke Kiriya1 (1.Univ. Tokyo)
キーワード：
Molybdenum disulfide (MoS2)、Contact Resistance、Transfer length method (TLM)
In the present work, we try to measure and reduce the contact resistance of MoS2/metal contact. Monolayers of MoS2 were extracted using the method of mechanical exfoliation. Contact resistance was measured using transfer length method (TLM). To enhance the contact resistance, monolayers of MoS2 were doped with an asymmetrical molecule (AM). Photoluminescence of as-exfoliated MoS2 shows an exciton peak at 1.86 eV, but after doping with AM, photoluminescence shows red-shift, due to an increase in the electron concentration in MoS2 after AM doping.